<p>Electronic devices based on oxide semiconductors are the focus of much attention, with crystalline materials generating huge commercial success. Indium–gallium–zinc oxide (IGZO) transistors have a higher mobility than amorphous silicon transistors, and an extremely low off-state current. C-axis aligned crystalline (CAAC) IGZO enables aggressive down-scaling, high reliability, and process simplification of transistors in displays and LSI devices. This original book introduces the CAAC-IGZO structure, and describes the physics and technology of this new class of oxide materials. It explains the crystallographic classification and characteristics of crystalline oxide<br />semiconductors, their crystallographic characteristics and physical properties, and how this unique material has made a major contribution to the field of oxide semiconductor thin films. Two further books in this series describe applications of CAAC-IGZO in flat-panel displays and LSI devices.</p> <p>Key features:</p> <ul> <li>Introduces the unique and revolutionary, yet relatively unknown crystalline oxide semiconductor CAAC-IGZO</li> <li>Presents crystallographic overviews of IGZO and related compounds.</li> <li>Offers an in-depth understanding of CAAC-IGZO.</li> <li>Explains the fabrication method of CAAC-IGZO thin films.</li> <li>Presents the physical properties and latest data to support high-reliability crystalline IGZO based on hands-on experience.</li> <li>Describes the manufacturing process the CAAC-IGZO transistors and introduces<br />the device application using CAAC-IGZO.<br /><br /></li> </ul>
Physics and Technology of Crystalline Oxide Semiconductor CAAC-IGZO
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Fundamentals
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