Advanced Interconnects for ULSI Technology

Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. <p><i>Advanced Interconnects for ULSI Technology</i> is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses:</p> <ul> <li>Interconnect functions, characterisations, electrical properties and wiring requirements</li> <li>Low-k materials: fundamentals, advances and mechanical  properties</li> <li>Conductive layers and barriers</li> <li>Integration and reliability including mechanical reliability, electromigration and electrical breakdown</li> <li>New approaches including 3D, optical, wireless interchip, and carbon-based interconnects</li> </ul> <p>Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.</p>